We have studied the reactivity of NH3 on GaAs (100) surface irradiated
by UV laser beam at low fluences (< 50 mJ/cm(2)). Laser treatment was
achieved in two experimental set up for complementary characterizatio
n of the surface state: first mass spectrometry allowed us to follow d
esorbed NHx species during the laser treatment and in a second step Ga
N+ could be identified as an evidence of N fixation using laser desorp
tion mass spectrometry of the treated surface. On a second experimenta
l system, Auger in-situ studies showed preferential N adsorption on th
e irradiated surface. Both characterization modes give evidence of flu
ence and laser shot number dependencies on laser treatment efficiency.
At 280 nm the N fixation is maximum for laser fluence of about 25 mJ/
cm(2).