ANISOTROPIC RESISTIVITY IN PULSED-LASER DEPOSITED BI2SR2CACU2O8+DELTAFILMS

Authors
LI ST RITZER A PROYER S STANGL E BAUERLE D RESCHAUER N
Citation
St. Li et al., ANISOTROPIC RESISTIVITY IN PULSED-LASER DEPOSITED BI2SR2CACU2O8+DELTAFILMS, Applied surface science, 96-8, 1996, pp. 713-716
Citations number
11
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
96-8
Year of publication
1996
Pages
713 - 716
Database
ISI
SICI code
0169-4332(1996)96-8:<713:ARIPDB>2.0.ZU;2-A
Abstract
An orientational dependence of the resistivity and critical current de nsity was observed in c-axis oriented Bi2Sr2CaCu2O8+delta films grown on MgO substrates by pulsed-laser deposition. As derived from X-ray di ffraction and scanning electron microscopy, the anisotropy is caused b y the small tilt angle of the c-axis with respect to the substrate sur face.