CHARACTERIZATION OF ZNO THIN-FILMS DEPOSITED BY LASER-ABLATION IN REACTIVE ATMOSPHERE

Authors
VERARDI P DINESCU M ANDREI A
Citation
P. Verardi et al., CHARACTERIZATION OF ZNO THIN-FILMS DEPOSITED BY LASER-ABLATION IN REACTIVE ATMOSPHERE, Applied surface science, 96-8, 1996, pp. 827-830
Citations number
17
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
96-8
Year of publication
1996
Pages
827 - 830
Database
ISI
SICI code
0169-4332(1996)96-8:<827:COZTDB>2.0.ZU;2-H
Abstract
ZnO thin films have been deposited by laser ablation of Zn targets in oxygen reactive atmosphere. A KrF laser (lambda = 248 nm, tau(FWHM) = 20 ns) and a YAG laser (lambda = 1.06 mu m, tau(FWHM) = 10 ns) were us ed as laser sources and Coming glass, silicon wafers and sapphire plat es were used as collectors, respectively. The crystalline structure, s urface morphology, optical, piezoelectric and acoustical properties of the deposited films are comparable acid, in certain conditions, super iors to that obtained by other techniques.