PREPARATION OF TIO2 THIN-FILMS BY PULSED-LASER DEPOSITION FOR WAVE-GUIDING APPLICATIONS

Authors
GARAPON C CHAMPEAUX C MUGNIER J PANCZER G MARCHET P CATHERINOT A JACQUIER B
Citation
C. Garapon et al., PREPARATION OF TIO2 THIN-FILMS BY PULSED-LASER DEPOSITION FOR WAVE-GUIDING APPLICATIONS, Applied surface science, 96-8, 1996, pp. 836-841
Citations number
15
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
96-8
Year of publication
1996
Pages
836 - 841
Database
ISI
SICI code
0169-4332(1996)96-8:<836:POTTBP>2.0.ZU;2-5
Abstract
TiO2 thin films have been deposited on SiO2/Si, MgO and Al2O3 substrat es by Pulsed Laser Deposition with a KrF excimer laser from a rutile c eramic target. From X-ray diffraction and Raman spectroscopy, their cr ystalline structure appear to be mainly anatase, The potentialities of waveguiding properties have been evaluated by measuring refractive in dex and thickness with m-line spectroscopy.