XPS AND AFM CHARACTERIZATION OF A VANADIUM-OXIDE FILM ON TIO2(100) SURFACE

Authors
CHIARELLO G BARBERI R AMODDEO A CAPUTI LS COLAVITA E
Citation
G. Chiarello et al., XPS AND AFM CHARACTERIZATION OF A VANADIUM-OXIDE FILM ON TIO2(100) SURFACE, Applied surface science, 99(1), 1996, pp. 15-19
Citations number
23
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
99
Issue
1
Year of publication
1996
Pages
15 - 19
Database
ISI
SICI code
0169-4332(1996)99:1<15:XAACOA>2.0.ZU;2-H
Abstract
Vanadium oxide has been grown in ultra high vacuum onto a rutile TiO2( 100) surface and studied by X-ray photoelectron spectroscopy and atomi c force microscopy. The AFM image showed a surface with a peculiar rou ghness made of three-dimensional structures having an average height o f 10 nm and an average base radius of about 100 nm.