ADSORPTION OF O-2 ON SI(111)7X7 COMPARED AT 300 AND 30K

Citation
G. Comtet et al., ADSORPTION OF O-2 ON SI(111)7X7 COMPARED AT 300 AND 30K, Surface science, 352, 1996, pp. 315-321
Citations number
24
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
352
Year of publication
1996
Pages
315 - 321
Database
ISI
SICI code
0039-6028(1996)352:<315:AOOOSC>2.0.ZU;2-6
Abstract
Adsorption of O-2 on Si(111) 7 X 7 at 30 K is studied by UV photoelect ron spectroscopy and compared to previous results at 300 K. This demon strates the existence of two distinct metastable states of O-2 adsorbe d on Si(111)7 X 7. Furthermore, it is shown that the initial relative population of these metastable states depends on both the temperature and the O-2 coverage.