AES (Auger electron spectroscopy) and EELS (electron energy loss spect
roscopy) have been used to study the first stages of the Al2O3/Si and
Al2O3/InP interfaces formations. Alumina was condensed using an evapor
ation cell heated by an electronic bombardment. InP is one of the most
promising materials for applications in high speed and optoelectronic
devices, but surface and interface properties have an important influ
ence on the performance of components. This paper is divided in two pa
rts: (1) Test of alumina deposition on Si(100) substrates and comparis
on with published results. (2) Condensation on InP(100) substrates (cl
eaned with a Ar+ bombardment).