FLUX DEPENDENCE OF THE SURFACTANT EFFECT IN NI AG(100) - A THEORETICAL-STUDY/

Recent experiments on systems such as Rh/Ag or Ni/Ag have shown that, in an intermediate range of temperature, the competition between the f lux of the deposited adatoms and the interdiffusion between the deposi t and the substrate can lead to an original growth mode in which a flo ating mono- or bi-substrate layer buries the deposited film. This surf actant effect has been previously modelled, in the simplified situatio n of successive flashes of a complete monolayer, in the framework of t he kinetic tight-binding Ising model. We show here that the extension of this model to the case of a continuous incoming flux leads to a wid e variety of behaviours concerning the depth and spatial extension of the buried film as a function of the flux.