The structure of fully three-dimensional de magnetron discharge is cla
rified by the use of the PIC/MC method. Magnets are placed in the form
of a racetrack with the practical dimensions of industrial sputtering
apparatus. The cathode sheath is found only in the region between the
two magnets. Plasma density is highest near the location of a double
thickness of sheath. Plasma is widely distributed between the electrod
es but its width is limited and equal to the gap between the magnets.
Copyright (C) 1996 Elsevier Science Ltd.