J. Davenas et Bv. Thien, THE EXFOLIATION OF LIF IMPLANTED WITH ALKALI IONS AT LOW-TEMPERATURE, Radiation effects and defects in solids, 136(1-4), 1995, pp. 1183-1188
The implantation of alkali ions in LiF at liquid nitrogen temperature
leads to the formation of a continuous metallic layer according to an
insulator-metal transition. Due to the precipitation of the implanted
ions, this metastable phase relaxes near room temperature giving rise
to the formation of a granular layer. The depth distribution of the im
planted ions determined by Rutherford Backscattering Spectrometry (RES
) shows the appearance of alkali ions at the crystal surface upon expo
sure to the air. Such a profile is explained by the crystal exfoliatio
n resulting from an explosive reaction of the implanted layer, which h
as the properties of the bulk alkali metal Scanning electron microscop
y (SEM) indicates that the thickness of the detached crystal platelets
corresponds to the penetration depth of the incident ions, so that th
e analysing beam detects in fact the implanted ions at the surface in
the exfoliated regions.