THE EXFOLIATION OF LIF IMPLANTED WITH ALKALI IONS AT LOW-TEMPERATURE

Citation
J. Davenas et Bv. Thien, THE EXFOLIATION OF LIF IMPLANTED WITH ALKALI IONS AT LOW-TEMPERATURE, Radiation effects and defects in solids, 136(1-4), 1995, pp. 1183-1188
Citations number
4
Categorie Soggetti
Physics, Condensed Matter","Nuclear Sciences & Tecnology
ISSN journal
10420150
Volume
136
Issue
1-4
Year of publication
1995
Pages
1183 - 1188
Database
ISI
SICI code
1042-0150(1995)136:1-4<1183:TEOLIW>2.0.ZU;2-B
Abstract
The implantation of alkali ions in LiF at liquid nitrogen temperature leads to the formation of a continuous metallic layer according to an insulator-metal transition. Due to the precipitation of the implanted ions, this metastable phase relaxes near room temperature giving rise to the formation of a granular layer. The depth distribution of the im planted ions determined by Rutherford Backscattering Spectrometry (RES ) shows the appearance of alkali ions at the crystal surface upon expo sure to the air. Such a profile is explained by the crystal exfoliatio n resulting from an explosive reaction of the implanted layer, which h as the properties of the bulk alkali metal Scanning electron microscop y (SEM) indicates that the thickness of the detached crystal platelets corresponds to the penetration depth of the incident ions, so that th e analysing beam detects in fact the implanted ions at the surface in the exfoliated regions.