INFLUENCE OF THE MISMATCH DISLOCATIONS ON THE ELASTIC PROPERTIES OF THE INSULATING FLUORIDE FILMS DEPOSITED ON SI(111)

Citation
Vv. Aleksandrov et Nl. Yakovlev, INFLUENCE OF THE MISMATCH DISLOCATIONS ON THE ELASTIC PROPERTIES OF THE INSULATING FLUORIDE FILMS DEPOSITED ON SI(111), Radiation effects and defects in solids, 137(1-4), 1995, pp. 1237-1240
Citations number
10
Categorie Soggetti
Physics, Condensed Matter","Nuclear Sciences & Tecnology
ISSN journal
10420150
Volume
137
Issue
1-4
Year of publication
1995
Pages
1237 - 1240
Database
ISI
SICI code
1042-0150(1995)137:1-4<1237:IOTMDO>2.0.ZU;2-K
Abstract
CaF2 and SrF2 films grown on Si(111) by molecular beam epitaxy were st udied by Brillouin spectoscopy method. The measured velocities of surf ace acoustic waves are in close agreement with those calculated within simple model of a layered structure. The only discrepancy was a decre ase of the velocity in CaF2 films of about 100 nn thick and was attrib uted to the different distribution of the defects arizing at the early stages of the growth modes at the beginning of CaF2 and SrF2 epitaxy on Si(111).