INFLUENCE OF THE MICROSTRUCTURE ON THE RESIDUAL STRAINS IN (111)AU NIMULTILAYERS/

A detailed study of stress and microstructure is performed on (111) Au /Ni multilayers prepared by molecular beam epitaxy and by sputtering. The microstructure is evaluated by electron microscopy and X-ray diffr action. The average stress is measured by the wafer-bending technique. The stress in Au and in Ni is determined with the sin(2) psi, techniq ue. Both the sign and the magnitude of the stresses are different betw een the two samples. This may be of importance with respect to the pro perties of these multilayers.