MICROSTRUCTURAL CHARACTERIZATION OF CO CU MULTILAYERS USING X-RAY-DIFFRACTION/

Authors
KOK KY HALL MJ LEAKE JA
Citation
Ky. Kok et al., MICROSTRUCTURAL CHARACTERIZATION OF CO CU MULTILAYERS USING X-RAY-DIFFRACTION/, Journal of magnetism and magnetic materials, 156(1-3), 1996, pp. 51-52
Citations number
6
Categorie Soggetti
Material Science","Physics, Condensed Matter
Journal title
Journal of magnetism and magnetic materials → ACNP
ISSN journal
03048853
Volume
156
Issue
1-3
Year of publication
1996
Pages
51 - 52
Database
ISI
SICI code
0304-8853(1996)156:1-3<51:MCOCCM>2.0.ZU;2-J
Abstract
Qualitative and quantitative characterisation of Co/Cu multilayers pre pared by magnetron sputtering have been performed using X-ray diffract ion. To gain information on the quality of the layering within the sam ples, both specular and off-specular (diffuse) measurements have been made, with the experimental scans interpreted using numerical techniqu es. We find inter-facial roughness that is partially correlated throug h the multilayer stack.