MICROSTRUCTURE AND MAGNETIC-PROPERTIES OF HIGHLY ORIENTED CO PT MULTILAYERS SPUTTER-DEPOSITED ON (111)SILICON/

Authors
TATNALL CJ POLLARD RJ GRUNDY PJ
Citation
Cj. Tatnall et al., MICROSTRUCTURE AND MAGNETIC-PROPERTIES OF HIGHLY ORIENTED CO PT MULTILAYERS SPUTTER-DEPOSITED ON (111)SILICON/, Journal of magnetism and magnetic materials, 156(1-3), 1996, pp. 61-62
Citations number
5
Categorie Soggetti
Material Science","Physics, Condensed Matter
Journal title
Journal of magnetism and magnetic materials → ACNP
ISSN journal
03048853
Volume
156
Issue
1-3
Year of publication
1996
Pages
61 - 62
Database
ISI
SICI code
0304-8853(1996)156:1-3<61:MAMOHO>2.0.ZU;2-E
Abstract
In this study we have sequentially dc magnetron sputtered a series of Co/Pt multilayer films on (111)-oriented Si wafers which have been sub jected to ion beam etching. Using high resolution transmission electro n microscopy. X-ray diffraction and PMOKE we have attributed enhanced magnetic properties to changes in microstructure and the degree of (11 1) texture.