Ma. Khan et al., MICROWAVE OPERATION OF GAN ALGAN-DOPED CHANNEL HETEROSTRUCTURE FIELD-EFFECT TRANSISTORS/, IEEE electron device letters, 17(7), 1996, pp. 325-327
We report on the microwave operation of 1 mu m gate AlGaN/GaN-doped ch
annel heterostructure field effect transistors (DC-HFET's) with the cu
toff frequency f(T) of 18.3 GHz. These devices exhibit the cutoff freq
uency-gate length product in excess of 18 GHz . mu m, comparable to th
at of the state-of-the-art GaAs MESFET's. We explain these improvement
s in the device performance by the increased sheet carrier density in
the device channel and by a reduction in the parasitic series resistan
ces, caused by doping the device channel.