MICROWAVE OPERATION OF GAN ALGAN-DOPED CHANNEL HETEROSTRUCTURE FIELD-EFFECT TRANSISTORS/

Citation
Ma. Khan et al., MICROWAVE OPERATION OF GAN ALGAN-DOPED CHANNEL HETEROSTRUCTURE FIELD-EFFECT TRANSISTORS/, IEEE electron device letters, 17(7), 1996, pp. 325-327
Citations number
12
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
07413106
Volume
17
Issue
7
Year of publication
1996
Pages
325 - 327
Database
ISI
SICI code
0741-3106(1996)17:7<325:MOOGAC>2.0.ZU;2-J
Abstract
We report on the microwave operation of 1 mu m gate AlGaN/GaN-doped ch annel heterostructure field effect transistors (DC-HFET's) with the cu toff frequency f(T) of 18.3 GHz. These devices exhibit the cutoff freq uency-gate length product in excess of 18 GHz . mu m, comparable to th at of the state-of-the-art GaAs MESFET's. We explain these improvement s in the device performance by the increased sheet carrier density in the device channel and by a reduction in the parasitic series resistan ces, caused by doping the device channel.