RHEED STUDIES OF INTERLAYER DIFFUSION IN THE SUBMONOLAYER GROWTH REGIME ON AG AG(111)/

Citation
M. Staley et al., RHEED STUDIES OF INTERLAYER DIFFUSION IN THE SUBMONOLAYER GROWTH REGIME ON AG AG(111)/, Surface science, 355(1-3), 1996, pp. 264-270
Citations number
17
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
355
Issue
1-3
Year of publication
1996
Pages
264 - 270
Database
ISI
SICI code
0039-6028(1996)355:1-3<264:RSOIDI>2.0.ZU;2-1
Abstract
We have used reflection high-energy electron diffraction (RHEED) to st udy the growth of Ag/Ag(111) as a function of temperature T=150-315 K and flux rate F=1/125-1/4800 ML/s by monitoring the decay of the specu lar beam intensity. No oscillations are observed, which is consistent with a 3D growth mode and the existence of a step edge barrier. The in tensity decay is independent of flux rate but depends on temperature. This can be understood in terms of the high diffusion rate on the fini te substrate terraces(similar to 500 Angstrom), which results in break down of the scaling conditions for nucleation and interlayer diffusion from higher to lower terraces.