THERMAL ELECTRON-ATTACHMENT TO HALOMETHANES .2. CH2F2, CHF3 AND CCLF3

Authors
SZAMREJ I KOSC H FORYS M
Citation
I. Szamrej et al., THERMAL ELECTRON-ATTACHMENT TO HALOMETHANES .2. CH2F2, CHF3 AND CCLF3, Radiation physics and chemistry, 48(1), 1996, pp. 69-74
Citations number
26
Categorie Soggetti
Nuclear Sciences & Tecnology","Chemistry Physical","Physics, Atomic, Molecular & Chemical
Journal title
Radiation physics and chemistry → ACNP
ISSN journal
0969806X
Volume
48
Issue
1
Year of publication
1996
Pages
69 - 74
Database
ISI
SICI code
0969-806X(1996)48:1<69:TETH.C>2.0.ZU;2-W
Abstract
The investigation of thermal electron attachment to freons (R13, R23 a nd R32) in the presence of carbon dioxide was continued using electron swarm method. Second-, third- and fourth-order kinetics was observed. The electron capture by (CF3Cl . CO2), (CH2F2) and (CHF3 . CO2) van d er Waals complexes has been proposed and corresponding rate constants estimated to be 1.7 x 10(-11) cm(3) molec(-1) s(-1), 1.1 x 10(-10) cm( 3) molec(-1) s(-1) and 3.0 x 10(-31) cm(6) molec(-2) s(-1). Copyright (C) 1996 Elsevier Science Ltd.