FILM THICKNESS SIMULATION FOR FABRICATING 6 IN DIAMETER ERBCO FILMS BY PARTIALLY-IONIZED BEAM DEPOSITION

The configuration of a PTB source was studied to grow uniform large-ar ea HTS (high-temperature superconducting) films for application to coi l or tape fabrication. The uniformity of thin films was simulated in c ases where a PIB source was placed with tilted (Theta) and off-axis (L ) orientation on the assumption that the thickness distribution of PIB deposited films followed the (cos alpha)(n) law. The tilted and off-a xis orientation was found to improve the uniformity of the thin films. The calculated uniformity at D = 430, Theta = 30 degrees and L = 30 w as greater than 90%, where D was the source-substrate distance, Fabric ation of HTS films at D = 430 reduced the source consumption and prolo nged the source life significantly, As-deposited films prepared on a 6 in. rotating sample holder at D = 430 have a composition variation of no more than +/-5% and a zero resistance temperature of 78-80 K.