M. Heissmeier et al., CALIBRATION OF A MICROLITHOGRAPHIC FABRICATION PROCESS USING NONDESTRUCTIVE TESTING AND RIGOROUS ELECTROMAGNETIC THEORY, Optik, 103(1), 1996, pp. 12-18
Comparison of rigorous electromagnetic calculations and measurements o
f grating diffraction efficiencies are applied to estimate the profile
of surface relief gratings. The depth of the gratings is estimated us
ing a Linnik interferometer. Information regarding the grating duty cy
cle (filling factor) and edge slope can then be extracted. The inverse
scatter process is inexpensive, non-destructive, and easy to carry ou
t and its accuracy is estimated. The results are applied to calibrate
a manufacturing process involving writing with a laser-beam-writing sy
stem and etching using reactive ion etching. It is shown that a combin
ation of TE and TM polarisation measurements and calculations can be u
sed to extract a great deal of accurate metrological information.