CALIBRATION OF A MICROLITHOGRAPHIC FABRICATION PROCESS USING NONDESTRUCTIVE TESTING AND RIGOROUS ELECTROMAGNETIC THEORY

Citation
M. Heissmeier et al., CALIBRATION OF A MICROLITHOGRAPHIC FABRICATION PROCESS USING NONDESTRUCTIVE TESTING AND RIGOROUS ELECTROMAGNETIC THEORY, Optik, 103(1), 1996, pp. 12-18
Citations number
53
Categorie Soggetti
Optics
Journal title
OptikACNP
ISSN journal
00304026
Volume
103
Issue
1
Year of publication
1996
Pages
12 - 18
Database
ISI
SICI code
0030-4026(1996)103:1<12:COAMFP>2.0.ZU;2-5
Abstract
Comparison of rigorous electromagnetic calculations and measurements o f grating diffraction efficiencies are applied to estimate the profile of surface relief gratings. The depth of the gratings is estimated us ing a Linnik interferometer. Information regarding the grating duty cy cle (filling factor) and edge slope can then be extracted. The inverse scatter process is inexpensive, non-destructive, and easy to carry ou t and its accuracy is estimated. The results are applied to calibrate a manufacturing process involving writing with a laser-beam-writing sy stem and etching using reactive ion etching. It is shown that a combin ation of TE and TM polarisation measurements and calculations can be u sed to extract a great deal of accurate metrological information.