HETEROEPITAXIAL GROWTH OF KNBO3 SINGLE-CRYSTAL FILMS ON SRTIO3 BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION

Authors
ONOE A YOSHIDA A CHIKUMA K
Citation
A. Onoe et al., HETEROEPITAXIAL GROWTH OF KNBO3 SINGLE-CRYSTAL FILMS ON SRTIO3 BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION, Applied physics letters, 69(2), 1996, pp. 167-169
Citations number
8
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
69
Issue
2
Year of publication
1996
Pages
167 - 169
Database
ISI
SICI code
0003-6951(1996)69:2<167:HGOKSF>2.0.ZU;2-E
Abstract
Potassium niobate (KNbO3) thin films have been deposited on silicon (S i) and strontium titanate (SrTiO3) substrates by metalorganic chemical vapor deposition. Stoichiometric KNbO3 films were obtained by adjusti ng the partial pressure of precursors. The crystallinity was examined by x-ray diffraction and reflection high-energy electron diffraction. Single-crystal (010) KNbO3 films with smooth surface were heteroepitax ially grown on (110)SrTiO3 substrate at 850 degrees C. (C) 1996 Americ an Institute of Physics.