A. Parretta et al., ELECTRICAL AND OPTICAL-PROPERTIES OF COPPER-OXIDE FILMS PREPARED BY REACTIVE RF MAGNETRON SPUTTERING, Physica status solidi. a, Applied research, 155(2), 1996, pp. 399-404
Copper oxide thin films were prepared by reactive rf magnetron sputter
ing of a pure copper target in an oxygen-argon atmosphere. The phases
of the deposited films strongly depend on the oxygen content in the sp
uttering gas. X-ray diffraction studies show that by controlling the o
xygen partial pressure single phase Cu2O and CuO can be obtained. The
resistivity of the Cu2O film in the present study is 43 Omega cm. The
optical constants were evaluated from transmission and reflection meas
urements.