ELECTRICAL AND OPTICAL-PROPERTIES OF COPPER-OXIDE FILMS PREPARED BY REACTIVE RF MAGNETRON SPUTTERING

Citation
A. Parretta et al., ELECTRICAL AND OPTICAL-PROPERTIES OF COPPER-OXIDE FILMS PREPARED BY REACTIVE RF MAGNETRON SPUTTERING, Physica status solidi. a, Applied research, 155(2), 1996, pp. 399-404
Citations number
17
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
00318965
Volume
155
Issue
2
Year of publication
1996
Pages
399 - 404
Database
ISI
SICI code
0031-8965(1996)155:2<399:EAOOCF>2.0.ZU;2-U
Abstract
Copper oxide thin films were prepared by reactive rf magnetron sputter ing of a pure copper target in an oxygen-argon atmosphere. The phases of the deposited films strongly depend on the oxygen content in the sp uttering gas. X-ray diffraction studies show that by controlling the o xygen partial pressure single phase Cu2O and CuO can be obtained. The resistivity of the Cu2O film in the present study is 43 Omega cm. The optical constants were evaluated from transmission and reflection meas urements.