AUGER-ELECTRON DIFFRACTION FROM NIO(100) LAYERS ON AG(100)

NiO(100) films have been prepared by deposition of Ni onto Ag(100) in an O-2 atmosphere. As deduced from low-energy electron diffraction and photoelectron spectroscopy the films are ordered and grow in a layer- by-layer mode. Auger electron diffraction of such films has been measu red for the O (512 eV) and Ni (848 eV) Auger transitions in the entire halfspace above the sample surface by using a toroidal electrostatic energy analyzer. The results are compared with computations which have been obtained by multiple scattering cluster calculations including s pherical wave corrections. The agreement between experimental and theo retical data is promising for the O transitions. For the Ni transition s we have found an unexpected intensity behavior which is tentatively ascribed to dominant contributions of inelastically scattered electron s.