ATOMIC AND ELECTRONIC-STRUCTURES OF OXYGEN-ADSORBED SI(001)SURFACES

Citation
T. Uchiyama et M. Tsukada, ATOMIC AND ELECTRONIC-STRUCTURES OF OXYGEN-ADSORBED SI(001)SURFACES, Surface science, 358(1-3), 1996, pp. 509-513
Citations number
16
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
358
Issue
1-3
Year of publication
1996
Pages
509 - 513
Database
ISI
SICI code
0039-6028(1996)358:1-3<509:AAEOOS>2.0.ZU;2-U
Abstract
We investigated the stable structures of oxygen-adsorbed Si(001) surfa ces and their electronic states. For this study, the first-principles molecular dynamics method with the ultra-soft pseudo-potential scheme of Vanderbilt was applied. We found three (meta)stable sites for atomi c oxygen adsorption - a dimer bridge and two different back-bond sites . The back-bond site of the down dimer-atom is the most stable. Here, the original dimer bond is preserved and the stress of the back-bond i s released. The electronegativity of oxygen enhances the difference of ionicity between the dimer atoms. Further, it is shown that this oxyg en-adsorbed site can be identified using scanning tunneling microscopy .