In this report we will describe a 'surfactant effect' of hydrogen for
nickel on Si(111)7 x 7 surface terminated by atomic hydrogen prior to
Ni-deposition. For hydrogen detection, time-of-flight type electron-st
imulated desorption (TOF-ESD) spectroscopy was used complementary with
Auger analysis, LEED and RHEED, 2-monolayer (ML) Ni film was grown on
a Si(111)7 x 7 surface in layer-by-layer growth mode and changed to 3
-dimensional Stranski-Krastanov mode over 2 ML. The 7 x 7 LEED pattern
was observed to 2 ML(-) of Ni. The Si-LVV Anger peak was observed to
IO ML. In contrast, a hydrogen-terminated surface showed d-7 x 7 struc
ture where the ESD measurement showed 1.5 ML of hydrogen, the Si-LVV A
uger peak had disappeared at 7 ML of Ni taking layer-by-layer mode, na
mely, Frank-Van der Merwe growth mode.