PRELIMINARY-STUDY OF [NI(EN)(3)](CF3CO2)(2) AND NI(EN) (HFPD)(2) AS PRECURSORS FOR METALORGANIC CHEMICAL-VAPOR-DEPOSITION - STRUCTURAL-PROPERTIES AND THERMAL BEHAVIORS (EN=ETHYLENEDIAMINE, HFPD=HEXAFLUOROPENTADIONATO(-))

[Ni(en)(3)](CF3CO2)(2) (1) and Ni(en)(hfpd)(2) (2) were both obtained by working in the system Ni2+/ethylenediamine/hexafluoropentanedione. They have been comparatively studied as possible sources for chemical vapour deposition. Both crystal structures have been determined from s ingle-crystal X-ray diffraction: compound 1 is triclinic, space group <P(1)over bar>, a = 9.335(1), b = 12.793(4), c = 8.512(2) Angstrom, al pha = 84.28(2), beta = 109.80(1), gamma = 104.25(2)degrees, and has an ionic structure; compound 2 is monoclinic, space group P2(1)/c, a = 1 0.863(8), b = 15.833(6), c = 11.096(9) Angstrom, beta = 99.27(4)degree s, and is a neutral complex. Thermal gravimetric analyses have shown t hat compound 2 could be sublimed under one atmosphere whereas compound 1 could not. Preliminary chemical vapour deposition experiments were carried out under vacuum. Compound 1 gave a coating of Ni3C in the ran ge 260-310 degrees C whereas compound 2 gave no coating up to a substr ate temperature of 350 degrees C.