LOCALIZED STATES OF A-GAP-N BY NITROGEN ION-BEAM-ASSISTED DEPOSITION

Citation
H. Kubota et al., LOCALIZED STATES OF A-GAP-N BY NITROGEN ION-BEAM-ASSISTED DEPOSITION, Journal of non-crystalline solids, 200, 1996, pp. 383-386
Citations number
9
Categorie Soggetti
Material Science, Ceramics
ISSN journal
00223093
Volume
200
Year of publication
1996
Part
1
Pages
383 - 386
Database
ISI
SICI code
0022-3093(1996)200:<383:LSOABN>2.0.ZU;2-J
Abstract
Nitrogen treated amorphous gallium phosphide (a-GaP:N) has p-type cond uction with nitrogen induced acceptor levels and wider mobility gap in the 3 eV range rather than crystal GaP (2.26 eV). The levels play a r ole for luminescent centers in the blue light region. According to ac- photoconductivity measurements, tail states at valence mobility band d ecreased with increasing nitrogen ion concentration. Because the tail states are due to Ga-Ga wrong bond, the reduction of the states may be described in terms of Ga-N-Ga and Ga-N related bonds.