Je. Rubio et al., MOLECULAR-DYNAMICS STUDY OF THE FLUENCE DEPENDENCE OF SI SPUTTERING BY 1 KEV AR+ IONS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 112(1-4), 1996, pp. 156-159
The fluence dependence of the Si sputtering by 1 keV Ar+ has been stud
ied by molecular dynamics simulations. To this purpose, previously amo
rphized samples with different initial argon concentration have been i
on bombarded and the sputtered atoms have been analyzed. The calculate
d sputtering yield increases with the argon content according to the e
xperimental results. The mechanisms involved in this sputtering enhanc
ement are discussed.