Nh. Zoubir et al., CHARACTERIZATION OF HYDROGENATED AMORPHOUS-SILICON PREPARED BY ION-BEAM-ASSISTED EVAPORATION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 112(1-4), 1996, pp. 263-266
Hydrogenated amorphous silicon thin films were deposited by electron c
yclotron resonance microwave plasma assisted evaporation. This paper s
hows the influence of substrate temperature on the hydrogen bonding, w
hich was characterized by infrared spectrometry and thermal desorption
spectrometry experiments.