PREPARATION OF AL2O3 FILMS BY A NEW CVD PROCESS COMBINING PLASMA AND ACCELERATED ION-BEAMS

Authors
NAKAI H KUWAHARA H SHINOHARA J KAWARATANI T SASSA T IKEGAMI Y
Citation
H. Nakai et al., PREPARATION OF AL2O3 FILMS BY A NEW CVD PROCESS COMBINING PLASMA AND ACCELERATED ION-BEAMS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 112(1-4), 1996, pp. 280-283
Citations number
5
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
Journal title
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms → ACNP
ISSN journal
0168583X
Volume
112
Issue
1-4
Year of publication
1996
Pages
280 - 283
Database
ISI
SICI code
0168-583X(1996)112:1-4<280:POAFBA>2.0.ZU;2-7
Abstract
We have developed a new p-CVD process which incorporates accelerated i ons in order to produce new functional materials which have multiple s tructures not available when using other processes. Aluminium oxide fi lms deposited on the nickel based superalloy (INCONEL718) by p-CVD com bined with simultaneous N-2(+) (accelerated to 10 keV) irradiation are polycrystalline and have very smooth surfaces and show superior adhes ion compared to conventional plasma CVD layers.