FAST DEPOSITION OF THIN AMORPHOUS FILMS USING AN EXPANDING THERMAL PLASMA

Authors
VANDESANDEN MCM GIELEN JWAM SEVERENS RJ PAFFEN RMJ SCHRAM DC
Citation
Mcm. Vandesanden et al., FAST DEPOSITION OF THIN AMORPHOUS FILMS USING AN EXPANDING THERMAL PLASMA, Pure and applied chemistry, 68(5), 1996, pp. 1155-1158
Citations number
14
Categorie Soggetti
Chemistry
Journal title
Pure and applied chemistry → ACNP
ISSN journal
00334545
Volume
68
Issue
5
Year of publication
1996
Pages
1155 - 1158
Database
ISI
SICI code
0033-4545(1996)68:5<1155:FDOTAF>2.0.ZU;2-C
Abstract
The basic elements of expanding plasma beam deposition are explained. The principle of dissociation is discussed and illustrated for an Ar/C 2H2 plasma. Recent results on high quality a-C:H deposition are discus sed. It is demonstrated that quality is not connected to growth rate. Moreover for a-C:H it is shown that quality improves with increasing g rowth rate.