THE ELECTROCHEMICAL-BEHAVIOR OF IRIDIUM DIOXIDE MODIFIED BY ION-IMPLANTATION

Citation
Ln. Kulikova et al., THE ELECTROCHEMICAL-BEHAVIOR OF IRIDIUM DIOXIDE MODIFIED BY ION-IMPLANTATION, Russian journal of electrochemistry, 32(6), 1996, pp. 691-695
Citations number
30
Categorie Soggetti
Electrochemistry
ISSN journal
10231935
Volume
32
Issue
6
Year of publication
1996
Pages
691 - 695
Database
ISI
SICI code
1023-1935(1996)32:6<691:TEOIDM>2.0.ZU;2-Q
Abstract
Thermolytic iridium oxide films whose surface was modified by ion impl antation of argon and oxygen ions are investigated electrochemically. Ion implantation is shown to be accompanied by changes in the space ch arge constituents and the emergence in the electrode surface layer of new active centers brought about mainly by radiation modification. The increase in the catalytic activity in the oxygen evolution reaction a t doped electrodes is shown to correlate with a part of the surface ch arge.