GROWTH OF A LIQUID-FILM ACCOMPANIED BY A ZERO-ORDER REACTION

Citation
V. Sirohi et al., GROWTH OF A LIQUID-FILM ACCOMPANIED BY A ZERO-ORDER REACTION, Chemical engineering & technology, 19(3), 1996, pp. 215-221
Citations number
17
Categorie Soggetti
Engineering, Chemical
ISSN journal
09307516
Volume
19
Issue
3
Year of publication
1996
Pages
215 - 221
Database
ISI
SICI code
0930-7516(1996)19:3<215:GOALAB>2.0.ZU;2-C
Abstract
The growth of a thin liquid film surrounded by gas pocket(s), undergoi ng absorption with a zero-order chemical reaction, has been simulated by an apt mathematical model in order to study the influence of variou s parameters involved. The solution has been obtained semianalytically using Goodman's integral method and solving the resulting differentia l equation by a fourth-order Runge-Kutta numerical integration algorit hm. The computations reveal the strong dependence of film growth on re action rate, diffusivity, and molar volume whereas the effect of gas-p ocket volume and initial film thickness are moderate.