Surface structure studies of GaAs(100) with and without chemical passi
vation have been made using atomic force microscopy (AFM). Passivation
was carried out using a solution of SeS2 which has proved to be a suc
cessful passivating agent as seen from the increase in the photolumine
scence (PL) intensity. Atomic force microscopy results indicate that i
t is possible to obtain ordered surface layers on GaAs using SeS2. (C)
1996 American Institute of Physics.