HIGH-FREQUENCY ULTRASONIC CLEANING TANK UTILIZING OBLIQUE-INCIDENCE

Authors
Citation
H. Hatano et S. Kanai, HIGH-FREQUENCY ULTRASONIC CLEANING TANK UTILIZING OBLIQUE-INCIDENCE, IEEE transactions on ultrasonics, ferroelectrics, and frequency control, 43(4), 1996, pp. 531-535
Citations number
10
Categorie Soggetti
Engineering, Eletrical & Electronic",Acoustics
ISSN journal
08853010
Volume
43
Issue
4
Year of publication
1996
Pages
531 - 535
Database
ISI
SICI code
0885-3010(1996)43:4<531:HUCTUO>2.0.ZU;2-G
Abstract
Transmission characteristics of a double-structured tank, used for hig h-frequency (1 MHz range) ultrasonic cleaning of semiconductor wafers and substrates, were improved by utilizing oblique incidence of ultras onic waves. As the sound transmittivity through a plate in water varie s with the angle of incidence, the bottom of the Pyrex glass inner con tainer was slanted at the angle where strong transmission occurred. In the slant-bottom container, an intensive and uniform sound pressure d istribution was measured with a polyvinylidene fluoride (PVDF) hydroph one probe. In comparison with the conventional horizontal-bottom conta iner, it was shown that the distributions as well as amplitude of soun d pressure were remarkably improved by slanting the bottom of the inne r container at the proper angle.