The diffusion of Fe and Ni in single-crystalline copper was investigat
ed in the temperature range from 651 to 870 K and from 613 to 949 K, r
espectively. Ion-beam sputtering in combination with secondary-ion mas
s spectrometry was employed to measure concentration depth profiles. T
he temperature dependence of the diffusion coefficients of Fe and Ni i
n copper can be described by D-Fe=(0.10+/-0.03)x10(-4) exp(-2.04+/-0.0
2 eV/kT) m(2) s(-1) and D-Ni=(0.62(-0.21)(+0.31))x10(-4) exp(-2.32+/-0
.025 eV/kT) m(2) s(-1). These results are compatible with earlier high
-temperature tracer data. A combination of those with the present low-
temperature data reveals a curvature in the respective Arrhenius plots
. This curvature is ascribed to the contribution of divacancies at hig
h temperatures. The temperature functions of D-Fe and D-Ni can be desc
ribed with the aid of the modified electrostatic model of impurity dif
fusion, assuming effective values for the charge difference between ho
st atom and impurity.