ELECTRODEPOSITION OF METALLIC MULTILAYERS WITH MODULATED ELECTRIC REGIMES

Citation
N. Lebbad et al., ELECTRODEPOSITION OF METALLIC MULTILAYERS WITH MODULATED ELECTRIC REGIMES, Thin solid films, 275(1-2), 1996, pp. 216-219
Citations number
12
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
275
Issue
1-2
Year of publication
1996
Pages
216 - 219
Database
ISI
SICI code
0040-6090(1996)275:1-2<216:EOMMWM>2.0.ZU;2-H
Abstract
Pulsed potentiostatic deposition provides a nevi means for the elabora tion of multilayers to produce magnetic sensors, Alternate layers of n ickel or cobalt of nominal thicknesses from a few angstroms to a few n anometres separated by a copper film have been electrodeposited from a single electrolyte containing a low concentration of copper ions. The thicknesses and deposition rate have been monitored in-situ with a qu artz microbalance during the growth of each layer in order to obtain p recise information to account for the physical properties of the heter ogeneous materials prepared by this process.