MOLECULAR-BEAM EPITAXY OF BERYLLIUM-CHALCOGENIDE-BASED THIN-FILMS ANDQUANTUM-WELL STRUCTURES

Citation
A. Waag et al., MOLECULAR-BEAM EPITAXY OF BERYLLIUM-CHALCOGENIDE-BASED THIN-FILMS ANDQUANTUM-WELL STRUCTURES, Journal of applied physics, 80(2), 1996, pp. 792-796
Citations number
23
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
80
Issue
2
Year of publication
1996
Pages
792 - 796
Database
ISI
SICI code
0021-8979(1996)80:2<792:MEOBTA>2.0.ZU;2-X
Abstract
A variety of BeMgZnSe-ZnSe- as well as BeTe-based quantum-well structu res has been fabricated and investigated. BeTe buffer layers improve t he growth start on GaAs substrates drastically compared to ZnSe/GaAs. The valence-band offset between BeTe and ZnSe has been determined to b e 0.9 eV (type II). Due to the high-lying valence band of BeTe, a BeTe -ZnSe pseudograding can be used for an efficient electrical contact be tween p-ZnSe and p-GaAs. BeMgZnSe quaternary thin-film structures have reproducibly been grown with high structural quality, and rocking cur ve widths below 20 arcsec could be reached. Quantum-well structures sh ow a high photoluminescence intensity even at room temperature. (C) 19 96 American Institute of Physics.