SILICA FILM DEPOSITION CONTROL DURING ALKALINE ELECTROCLEANING

To avoid tinplate fabrication problems, the silica deposited during th e cleaning step should be controlled in a narrow range (between 2 and 3 mg/m(2)). A first study has allowed to determine the mechanisms invo lved. Based on this fundamental research, a simulation of an industria l cleaning has emphasized the most important parameters to keep under control for a homogeneous deposit to be achieved.