IN-SITU OBSERVATION OF ETCHING PROCESSES OF SILICA GLASSES BY SILICONMELTS

Citation
A. Ikari et al., IN-SITU OBSERVATION OF ETCHING PROCESSES OF SILICA GLASSES BY SILICONMELTS, JPN J A P 1, 35(6A), 1996, pp. 3547-3552
Citations number
9
Categorie Soggetti
Physics, Applied
Volume
35
Issue
6A
Year of publication
1996
Pages
3547 - 3552
Database
ISI
SICI code
Abstract
In order to investigate etching of silica crucibles by silicon melts d uring silicon crystal growth, an in situ observation was made on forma tion of white dots with brown edges, called ''brownish rings'', at the silica-silicon melt interface. The formation of brownish rings was fo und to be influenced by melt temperature, OH concentration in silica g lasses and oxygen concentration in silicon melts. The growth of browni sh rings shows a linear dependence on dipping time and the growth mech anism is essentially the same as that for the devitrification of silic a glasses. These results suggest that in order to control the etching of silica crucibles during silicon crystal growth, it is important to control both properties of silica glass and oxygen concentration in si licon melts.