EFFECTS OF HE GAS ADDITION ON THE PRODUCTION OF ACTIVE PARTICLES IN RF MAGNETRON SPUTTERING

We measured optical emission spectra during the deposition of Bi2Sr2Ca n-1CunOx (BSCCO) films by an rf magnetron sputtering method with a BSC CO powder target. It was shown that the active particles produced are ionized oxygen molecules and CuO radicals when He + O-2 is used as a s puttering gas. The results of X-ray photoelectron spectroscopy indicat ed that the BSCCO films prepared using He gas have the same metal comp osition as the target. In addition, we confirmed that the use of He as a sputtering gas enhances the oxidation in the preparation of CuO fil ms.