An illumination system has been designed to extend the resolution limi
ts and depth of focus (DOF) parameters for the next generation of i-li
ne and deep-ultraviolet (DUV) wafer steppers, This high-efficiency pro
jection scheme allows a wide range of coherence, annularity, and conti
nuously variable numerical aperture (NA) illumination. Implementation
of these concepts in an i-line stepper and initial performance results
are described, The imaging performance was analyzed with simulation s
tudies and verified by measurement results.