The influence of gas flow and H-2 dilution ratio on the built and surf
ace properties of a-SiC:H films is discussed. Infrared and electron sp
in resonance studies reveal that structural relaxation is achieved thr
ough control of surface reactions. On the other hand, the surface morp
hology as observed by atomic force microscopy is shown to be determine
d by growth rate under supply-limited conditions. This evidence implie
s that an improvement in bulk properties does not always lead to surfa
ce smoothening. Both surface reaction control and growth rate control
are found to be crucial if films with excellent bulk and surface prope
rties are to be obtained.