DEPOSITION OF SURFACE-LAYERS BY THE LPCVD PROCESS CONDUCTED IN A TICL4-H-2-N-2 ATMOSPHERE - CONTRIBUTION OF THE CARBON CONTAINED IN THE STEEL SUBSTRATE AND OF TOTAL PRESSURE OF THE GASEOUS ATMOSPHERE

Authors
MICHALSKI J
Citation
J. Michalski, DEPOSITION OF SURFACE-LAYERS BY THE LPCVD PROCESS CONDUCTED IN A TICL4-H-2-N-2 ATMOSPHERE - CONTRIBUTION OF THE CARBON CONTAINED IN THE STEEL SUBSTRATE AND OF TOTAL PRESSURE OF THE GASEOUS ATMOSPHERE, Journal of materials science letters, 15(13), 1996, pp. 1169-1171
Citations number
7
Categorie Soggetti
Material Science
Journal title
Journal of materials science letters → ACNP
ISSN journal
02618028
Volume
15
Issue
13
Year of publication
1996
Pages
1169 - 1171
Database
ISI
SICI code
0261-8028(1996)15:13<1169:DOSBTL>2.0.ZU;2-1