HIGH-SPATIAL-RESOLUTION RESISTIVITY MAPPING OF LARGE-AREA YBCO FILMS BY A NEAR-FIELD MILLIMETER-WAVE MICROSCOPE

Citation
M. Golosovsky et al., HIGH-SPATIAL-RESOLUTION RESISTIVITY MAPPING OF LARGE-AREA YBCO FILMS BY A NEAR-FIELD MILLIMETER-WAVE MICROSCOPE, IEEE transactions on microwave theory and techniques, 44(7), 1996, pp. 1390-1392
Citations number
14
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
00189480
Volume
44
Issue
7
Year of publication
1996
Pages
1390 - 1392
Database
ISI
SICI code
0018-9480(1996)44:7<1390:HRMOLY>2.0.ZU;2-0
Abstract
We demonstrate a new millimeter-wave technique for the resistivity map ping of large-area conducting films, namely, a near-field resistivity microscope. The microscope is based on the idea that electromagnetic w aves are transmitted through a narrow resonant slit with high efficien cy. By scanning this slit at fixed height above an inhomogeneous condu cting surface and measuring the intensity and phase of the reflected w ave, the resistivity of this surface may be determined with a 10-100 m u m spatial resolution using 80-GHz radiation. Using this technique, w e map normal-sate resistivity of 1 in x 1 in YBCO films at ambient tem perature. In some films we find inhomogeneities of the normal-state sh eet resistance of the order of 10%-20%.