THE ROLE OF THE NEGATIVELY CHARGED (SI3SI-F-2)(-) COMPLEXES IN INTERACTIONS OF FLUORINE WITH THE (111) SURFACE OF SILICON

We used the AM1 quantum chemical and cluster models to study the mecha nism of formation of a SiF2-like layer and dissociation of the Si-Si b ond during the interaction of atomic fluorine with the (III) surface o f silicon. It is shown that the negatively charged (Si-3-Si-F-2)(-) co mplex with the five-coordinated centered silicon atom plays an importa nt part in these processes. The above complex participates in the inte raction of atomic fluorine with silicon to form a SiF2-like layer and break the subsurface Si-Si bonds without penetration of fluorine atoms into the subsurface silicon layers.