SOURCE OF INTENSE WIDE BEAMS OF GAS IONS BASED ON THE DISCHARGE WITH A HOLLOW-CATHODE IN A MAGNETIC-FIELD

An ion source is described that is based on a low-pressure glow discha rge (less than or equal to 0.1 Pa) with oscillating electrons in a wea k magnetic field (0.2-5 mT). It is shown that ion beams can be produce d that have a cross-section area up to 1000 cm(2), a current density o f 0.1-10 mA/cm(2), and a distribution inhomogeneity over the beam cros s section of less than or equal to 10%. Mass-charge composition of the ion beam was measured with O-2, N-2, and Ar. It was shown that the im purity content could be reduced down to a few fractions of a percent. Having a cold cathode with an increased service life (similar to 1000 hours), the source for the ion-implantation treatment produces a wide (similar to 150 cm(2)) ion beam of energy up to 40 keV and an average current up to 50 mA in the pulsed-periodic regime (f = 1-50 s(-1), t = 1 ms).