GAS-PHASE ION MOLECULE REACTIONS IN PHOSPHINE/METHYLSILANE MIXTURES/

Citation
G. Cetini et al., GAS-PHASE ION MOLECULE REACTIONS IN PHOSPHINE/METHYLSILANE MIXTURES/, Journal of organometallic chemistry, 519(1-2), 1996, pp. 169-175
Citations number
28
Categorie Soggetti
Chemistry Inorganic & Nuclear","Chemistry Inorganic & Nuclear
ISSN journal
0022328X
Volume
519
Issue
1-2
Year of publication
1996
Pages
169 - 175
Database
ISI
SICI code
0022-328X(1996)519:1-2<169:GIMRIP>2.0.ZU;2-V
Abstract
Phosphine/methylsilane mixtures investigated by ion trap mass spectrom etry and reaction pathways together with the rate constants of the mai n reactions are reported. Mechanisms of ion/molecule reactions have be en elucidated by single and multiple isolation steps. The SiHn+ (n = 0 -3) ions react with phosphine to give mainly the SiPHn+ (n = 1-4) ion family. These ions further react with phosphine or methylsilane to yie ld SiP2Hn+ (n = 2, 4) and Si2CPHn+ (n = 5-8) ions respectively. Mixed SiPHn+ (n = 3, 4) ions also originate from the PHn+ (n = 1, 2) phosphi ne primary ions. Hydride abstraction from methylsilane is a very commo n process, which takes place from a great number of ionic precursors, including the PHn+ (n = 0-2) ions, yielding the SiCH5+ species. Trends in relative abundance, respectively summed for the SiCPHn+ (n = 5, 6) , Si2CPHn+ (n = 5-8) and Si2C2PHn+ (n = 7-12) families of ions as a fu nction of reaction time for different PH3/CH3SiH3 pressure ratios, sho w that the nucleation of mixed Si-P ions proceeds to a lower extent wi th excess phosphine and is not substantially influenced by excess meth ylsilane.