G. Cetini et al., GAS-PHASE ION MOLECULE REACTIONS IN PHOSPHINE/METHYLSILANE MIXTURES/, Journal of organometallic chemistry, 519(1-2), 1996, pp. 169-175
Phosphine/methylsilane mixtures investigated by ion trap mass spectrom
etry and reaction pathways together with the rate constants of the mai
n reactions are reported. Mechanisms of ion/molecule reactions have be
en elucidated by single and multiple isolation steps. The SiHn+ (n = 0
-3) ions react with phosphine to give mainly the SiPHn+ (n = 1-4) ion
family. These ions further react with phosphine or methylsilane to yie
ld SiP2Hn+ (n = 2, 4) and Si2CPHn+ (n = 5-8) ions respectively. Mixed
SiPHn+ (n = 3, 4) ions also originate from the PHn+ (n = 1, 2) phosphi
ne primary ions. Hydride abstraction from methylsilane is a very commo
n process, which takes place from a great number of ionic precursors,
including the PHn+ (n = 0-2) ions, yielding the SiCH5+ species. Trends
in relative abundance, respectively summed for the SiCPHn+ (n = 5, 6)
, Si2CPHn+ (n = 5-8) and Si2C2PHn+ (n = 7-12) families of ions as a fu
nction of reaction time for different PH3/CH3SiH3 pressure ratios, sho
w that the nucleation of mixed Si-P ions proceeds to a lower extent wi
th excess phosphine and is not substantially influenced by excess meth
ylsilane.