RAMAN-SCATTERING CHARACTERIZATION OF STRAINED GAAS INAS LAYERS GROWN BY MOVPE/

Citation
Pp. Lottici et al., RAMAN-SCATTERING CHARACTERIZATION OF STRAINED GAAS INAS LAYERS GROWN BY MOVPE/, Solid state communications, 99(8), 1996, pp. 537-540
Citations number
19
Categorie Soggetti
Physics, Condensed Matter
Journal title
ISSN journal
00381098
Volume
99
Issue
8
Year of publication
1996
Pages
537 - 540
Database
ISI
SICI code
0038-1098(1996)99:8<537:RCOSGI>2.0.ZU;2-9
Abstract
GaAs layers have been grown for different times by MOVPE on InAs (001) substrates at different growth temperatures and on InAs (111) substra te of A and B polarities. A residual tensile strain has been evidenced by Raman measurements of the LO and TO phonon red-shifts. On the (001 ) surface, the best quality of the layer is found at 550 degrees C, wh ere a quasi 2D growth is observed, whereas in the (111) case a 3D grow th of pyramidal islands is present on both surface polarities and bett er uniformity is found for the growth on the A polar surface. Copyrigh t (C) 1996 Elsevier Science Ltd