An ab initio local density functional cluster program, AIMPRO, is used
to examine nitrogen related shallow thermal donor defects in silicon.
We find the bonding of oxygen with interstitial nitrogen in N-i-O-2i
to be almost ''normal,'' but the O atoms move slightly out of their bo
nd centered sites causing the deep donor level of N-i to become shallo
w. The defect has properties consistent with those experimentally obse
rved for shallow thermal donors. We also find that a CiH-O-2i defect h
as very similar electronic properties, and suggest that shallow therma
l donors do not have a unique composition.