AN EXTENDED HEXAGON MODEL FOR CU UNDERPOTENTIAL DEPOSITION ON AU(111)

Citation
M. Legault et al., AN EXTENDED HEXAGON MODEL FOR CU UNDERPOTENTIAL DEPOSITION ON AU(111), Journal of electroanalytical chemistry [1992], 409(1-2), 1996, pp. 79-86
Citations number
30
Categorie Soggetti
Electrochemistry,"Chemistry Analytical
Journal title
Journal of electroanalytical chemistry [1992]
ISSN journal
15726657 → ACNP
Volume
409
Issue
1-2
Year of publication
1996
Pages
79 - 86
Database
ISI
SICI code
Abstract
The hard hexagon adsorption isotherm of Baxter and Joyce was previousl y used in a statistical model for the underpotential deposition (upd) of Cu on Au(111). This model gave a plausible physical picture of Cu u pd on Au(111) and was able to reproduce the gross features of the volt ammogram. In the present work the hexagon model is extended to include a mean field treatment of the adsorbate interactions. Using this exte nded hexagon model, coupled adsorption isotherms for copper and sulfat e ions are obtained and solved numerically. These isotherms yield theo retical quartz microbalance curves which compare well with the experim ental ones. The model voltammogram reproduces the experimental voltamm ogram including the finer details of the broad foot region.